[Fuuk-ext-l] TODAY: Invitation to Seminar of Institute of Physics, MFF UK, on Tue 19.10. from 14:00, speaker Ing. Ján Lančok, Ph.D.

[Jaroslav Hamrle]

Dear colleagues,

It is my pleasure to invite you to today's Seminar of Institute of 
Physics of Charles University, entitled:

*Fabrication of functional thin-film materials with a complex 
composition by pulsed laser deposition*

Speaker: Ing. Ján Lančok, Ph.D. <https://www.fzu.cz/lide/ing-jan-lancok-phd>

Time: *Tuesday 19.10. from 14:00*

Place: Seminar room of Institute of Physics F285 (atelier) , second 
floor, Ke Karlovu 5, Prague

/Abstract: The first experiment with Pulsed Laser Deposition (PLD) was 
carried out few years after the discovery of the first laser (1965) [1], 
but the method remained little known till the late 1980's Since 1987 
when Dijkkamp et al [2] published their ground breaking paper on pulsed 
laser deposition (PLD) of Y1Ba2Cu3O7−x (YBCO) there has been enormous 
interest and growth in the use of this unique physical vapour deposition 
(PVD) process. In principal, PLD belongs in the big PVD method, along 
with Molecular Beam Epitaxy and different modification of evaporation 
and sputtering. Conceptually and experimentally PLD is an extremely 
simple method, based on the plasma creation by means of focused pulsed 
laser beam, Fig. 1. This evaporation becomes nonequilibristic. Due to 
this nonequillibrium the PLD has been very successful in the fabrication 
of complicated oxide structures, whose constituents may have vapour 
pressures that differ by 106. Film growth can be carried out in a 
reactive environment containing any kinds of gas with/or without plasma 
excitation. Due to this the PLD method is very flexible and allows 
successful preparation of thin film from different kind of materials [3,4].
In the presentation the fundamentals of PLD, physical processes 
occurring during the thin films fabrication and comparison between 
another deposition techniques will be given. The attention will be 
focused on the description of the fabrication of following materials:
     • high Tc superconductors YBCO
     • ferroelectric perovskite materials SrTiO3
     • multiferroic materials BiFeO3 and Ɛ-Fe2O3
     • oxides and composites for chemical sensors
     • copper halides and oxides
     • biocompatabile ceramics
For many materials, PLD has been established as a technique offering 
superior film properties in comparison to films deposited by other 
physical vapor-deposition techniques.

References
[1] Smith H M and Turner A G 1965 Appl. Opt. 4 147–8
[2] Dijkkamp D et. all. 1987 Appl. Phys. Lett. 51 619
[3] Chrisey D B and Hubler G K (ed) 1994 Pulsed Laser Deposition of Thin 
Films (New York: Wiley)
[4] Eason R (ed) 2007 Pulsed Laser Deposition of Thin Films (New York: 
Wiley)
/

With my best regards

Jaroslav Hamrle


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Mgr. Jaroslav Hamrle, Ph.D.
Institute of Physics, room F232
Faculty of Mathematics and Physics
Charles University
Ke Karlovu 5
121 16 Prague
Czech Republic

tel: +420-95155 1340
email: hamrle na karlov.mff.cuni.cz
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